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Global Lithography Metrology Equipment Market - Industry Trends and Forecast to 2029

Semiconductors and Electronics | Upcoming Report | Apr 2022 | Global | 350 Pages | No of Tables: 220 | No of Figures: 60

Report Description

Global Lithography Metrology Equipment Market, By Technology (Critical-Dimension Scanning Electron Microscope (CD-SEM), Optical Critical Dimension Metrology (OCD), Overlay Control, Others), Product (Chemical Control Equipment, Gas Control Equipment, Others), Application (Quality Control and Inspection, Reverse Engineering, Virtual Simulation, Others) – Industry Trends and Forecast to 2029.


Market Analysis and Size

Miniaturized electronic devices are widely being utilized from the semiconductor industry due to the increase in consumer preference of high-performance electronics. Metrology is considered crucial for controlling, optimizing and ensuring highest yield in semiconductor manufacturing processes.

Global Lithography Metrology Equipment Market was valued at USD 1184.49 million in 2021 and is expected to reach USD 605.60 million by 2029, registering a CAGR of 7.60% during the forecast period of 2022-2029. Quality Control and Inspection is expected to witness high growth in the application segment owing to the rise in industrialization. The market report curated by the Data Bridge Market Research team includes in-depth expert analysis, import/export analysis, pricing analysis, production consumption analysis, and pestle analysis.

Market Definition

Lithography refers to a process where a pattern from a photomask is transferred to the surface of the wafer. The wafer gets exposed to ultraviolet laser beam during the lithography process in which the ultraviolet laser beam passes through photomask layer.

Report Scope and Market Segmentation

Report Metric

Details

Forecast Period

2022 to 2029

Base Year

2021

Historic Years

2020 (Customizable to 2019 - 2014)

Quantitative Units

Revenue in USD Million, Volumes in Units, Pricing in USD

Segments Covered

Technology (Critical-Dimension Scanning Electron Microscope (CD-SEM), Optical Critical Dimension Metrology (OCD), Overlay Control, Others), Product (Chemical Control Equipment, Gas Control Equipment, Others), Application (Quality Control and Inspection, Reverse Engineering, Virtual Simulation, Others)

Countries Covered

U.S., Canada, Mexico, Brazil, Argentina, Rest of South America, Germany, Italy, U.K., France, Spain, Netherlands, Belgium, Switzerland, Turkey, Russia, Rest of Europe, Japan, China, India, South Korea, Australia, Singapore, Malaysia, Thailand, Indonesia, Philippines, Rest of Asia-Pacific, Saudi Arabia, U.A.E, South Africa, Egypt, Israel, Rest of Middle East and Africa (MEA).

Market Players Covered

DVANTEST CORPORATION (Japan), Applied Materials, Inc. (US), ASML (Netherlands), Canon Inc. (Japan), Hitachi High-Tech Corporation. (Japan), KLA Corporation. (US), Onto Innovation. (US), Nanometrics Inc. (US), Nikon Metrology Inc. (US), Nova Measuring Instruments Ltd. (Israel), Tokyo Electron Limited. (Japan), among others

Market Opportunities

  • Rise in developments of technologies such as MEMS devices, and RFID among other power devices
  • Rise in of semiconductor and other related industries across the globe
  • Increase in adoption of internet of things enabled products and equipment

Lithography Metrology Equipment Market Dynamics

This section deals with understanding the market drivers, advantages, opportunities, restraints and challenges. All of this is discussed in detail as below:

Drivers

  • Growth of Semiconductor

The rise in of semiconductor and other related industries across the globe acts as one of the major factors driving the growth of lithography metrology equipment market. The increase in preferences towards miniaturized electronic devices has a positive impact on the market.

  • Penetration of Internet of Things

The increase in adoption of internet of things enabled products and equipment accelerate the market growth. Also, surge in demand for enhanced consumer electronics increasing requirement of flexible and compact integrated circuits assist in the expansion of the market.

  • Developments of Technologies

The rise in developments of technologies such as MEMS devices, and RFID, among other power devices escalating demand for thin wafers accelerate the market growth. Wafer backgrinding process is widely used for declining the thickness of wafers.

Additionally, rapid industrialization, surge in investments and development of manufacturing sectors positively affect the lithography metrology equipment market.

Opportunities

Furthermore, advancements in the technique and equipment extend profitable opportunities to the market players in the forecast period of 2022 to 2029. Also, supportive government initiatives will further expand the market.

Restraints/Challenges

On the other hand, high cost associated with the equipment is expected to obstruct market growth. Also, rise in complexity in functioning of IC devices is projected to challenge the lithography metrology equipment market in the forecast period of 2022-2029.

This lithography metrology equipment market report provides details of new recent developments, trade regulations, import-export analysis, production analysis, value chain optimization, market share, impact of domestic and localized market players, analyses opportunities in terms of emerging revenue pockets, changes in market regulations, strategic market growth analysis, market size, category market growths, application niches and dominance, product approvals, product launches, geographic expansions, technological innovations in the market. To gain more info on lithography metrology equipment market contact Data Bridge Market Research for an Analyst Brief, our team will help you take an informed market decision to achieve market growth.

COVID-19 Impact on Lithography Metrology Equipment Market

The COVID-19 had a negative impact on the lithography metrology equipment market owing to the strict lockdowns and social distancing to contain the spread of the virus. The economic uncertainty, partial shutdown of the business and low consumer confidence impacted demand for lithography metrology equipment. The supply chain got hampered during the pandemic along with delay logistics activities. However, the lithography metrology equipment market is expected to regain its pace during the post pandemic scenario due to the easing on the restrictions.

Global Lithography Metrology Equipment Market Scope and Market Size

The lithography metrology equipment market is segmented on the basis of technology, product and application. The growth amongst these segments will help you analyze meager growth segments in the industries and provide the users with a valuable market overview and market insights to help them make strategic decisions for identifying core market applications.

Technology

  • Critical-Dimension Scanning Electron Microscope (CD-SEM)
  • Optical Critical Dimension Metrology (OCD)
  • Overlay Control
  • Others

Product

  • Chemical Control Equipment
  • Gas Control Equipment
  • Others

Application

  • Quality Control and Inspection
  • Reverse Engineering, Virtual Simulation
  • Others

Lithography Metrology Equipment Market Regional Analysis/Insights

The lithography metrology equipment market is analyzed and market size insights and trends are provided by country, technology, product and application as referenced above.

The countries covered in the lithography metrology equipment market report are U.S., Canada, Mexico, Brazil, Argentina, Rest of South America, Germany, Italy, U.K., France, Spain, Netherlands, Belgium, Switzerland, Turkey, Russia, Rest of Europe, Japan, China, India, South Korea, Australia, Singapore, Malaysia, Thailand, Indonesia, Philippines, Rest of Asia-Pacific, Saudi Arabia, U.A.E, South Africa, Egypt, Israel, Rest of Middle East and Africa (MEA).

North America dominates the lithography metrology equipment market because of the adoption of advanced technology along with growing number of consumer electronic devices within the region.

Asia-Pacific is expected to witness significant growth during the forecast period of 2022 to 2029 because of the rise in urbanization as well as industrialization in the regions.

The country section of the report also provides individual market impacting factors and changes in regulation in the market domestically that impacts the current and future trends of the market. Data points like down-stream and upstream value chain analysis, technical trends and porter's five forces analysis, case studies are some of the pointers used to forecast the market scenario for individual countries. Also, the presence and availability of global brands and their challenges faced due to large or scarce competition from local and domestic brands, impact of domestic tariffs and trade routes are considered while providing forecast analysis of the country data.   

Competitive Landscape and Lithography Metrology Equipment Market

The lithography metrology equipment market competitive landscape provides details by competitor. Details included are company overview, company financials, revenue generated, market potential, investment in research and development, new market initiatives, global presence, production sites and facilities, production capacities, company strengths and weaknesses, product launch, product width and breadth, application dominance. The above data points provided are only related to the companies' focus related to lithography metrology equipment market.

Some of the major players operating in the lithography metrology equipment market are

  • DVANTEST CORPORATION (Japan)
  • Applied Materials, Inc. (US)
  • ASML (Netherlands)
  • Canon Inc. (Japan)
  • Hitachi High-Tech Corporation. (Japan)
  • KLA Corporation. (US)
  • Onto Innovation. (US)
  • Nanometrics Inc. (US)
  • Nikon Metrology Inc. (US)
  • Nova Measuring Instruments Ltd. (Israel)
  • Tokyo Electron Limited. (Japan)


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