Due to the reaction of vapor-phase chemical reactants, chemical vapor deposition (CVD) is the development of a non-volatile solid film on a surface. They are mainly used for the formation of coatings for different applications such as corrosion resistance, high temperature protection, wear resistance and other. CVD is an experimental system carried out in a CVD reactor at high temperatures of about 1925 ° F. CVD covers different processes such as low pressure chemical vapor deposition, laser chemical vapor deposition, photochemical vapor deposition, chemical vapor infiltration and other. They usually are fine grained, have high purity and impervious. Some of the common technologies used in CVD are atomic layer CVD, organometallic CVD, plasma enhanced CVD, plasma assisted CVD among others.
Some of the factors responsible for the growth of this market:
The global chemical vapor deposition (CVD) equipment market is segmented on the basis of category as CVD equipment, CVD services, and CVD materials; applications as coatings, electronics, catalysis, and others; technology as atomic layer CVD, laser induced CVD, organometallic CVD, plasma Enhanced CVD, plasma assisted CVD, low pressure CVD, and others; product as atmospheric-Pressure chemical vapor deposition, low-pressure chemical vapor deposition, density-plasma chemical vapor deposition, and metal-organic chemical vapor phase deposition and end- users as memory, foundry, IDM, and logic
Some of the launches and acquisition in the market are as follow:
“According to Data Bridge Market Research, global chemical vapor deposition (CVD) equipment market is set to witness a substantial CAGR of 7.95% in the forecast period of 2019- 2026”
Few of the major competitors currently working in the global CVD equipment market are AIXTRON, Applied Materials, Inc., ASM International, CVD Equipment Corporation, Hitachi Kokusai Electric Inc, IHI Corporation, Jusung Engineering Co., Ltd., LAM RESEARCH CORPORATION, Plasma-Therm, Tokyo Electron Limited, ULVAC, Veeco Instruments Inc., Oxford Instruments, Mustang Vacuum Systems among others.
Increasing demand of CVD in microelectronic application will accelerate the demand of the CVD equipment in the market. There is also increasing usage of high- performance films in solar panel which will also affect the market positively. Many technological development and innovations are taking place in CVD equipment which will also enhance the market. Rising investment in semiconductor industry is further creating new opportunities for this market.