““Increasing Utilization of Chlorine Trifluoride in Semiconductor Manufacturing”
- The growing demand for high-performance semiconductor chips is driving the adoption of chlorine trifluoride as a superior etching and cleaning agent in the electronics industry, particularly for advanced node fabrication
- Stricter quality control standards in semiconductor manufacturing and the need for ultra-pure processing chemicals are accelerating investments in chlorine trifluoride-based dry etching and chamber cleaning technologies
- Innovations in plasma etching techniques, chemical vapor deposition (CVD) cleaning, and fluorine-based semiconductor processing are enhancing the precision, efficiency, and safety of semiconductor fabrication
For instance,
- In March 2024, Samsung Electronics announced the adoption of chlorine trifluoride-based etchants for next-generation 3nm and 2nm chip production, improving wafer yield and reducing contamination
- In December 2023, TSMC expanded its investment in advanced semiconductor materials, incorporating chlorine trifluoride for chamber cleaning and precision etching in its new fabs in Taiwan and the U.S
- In October 2023, Intel collaborated with a specialty chemical supplier to enhance safety measures in the handling and storage of chlorine trifluoride, ensuring compliance with industry best practices
- As the semiconductor industry continues to advance toward smaller, more efficient chips, chlorine trifluoride will remain a critical enabler in high-precision etching, cleaning, and contamination control, ensuring sustained market growth in the electronics sector
