- In January 2024, Jenoptik revealed plans to invest in a new EBL system provided by Vistec for a high-tech facility under construction in Dresden. This investment will enhance capabilities in manufacturing micro-optical components for semiconductor and optical communication sectors.
- In June 2024, Reports indicate that TSMC is expected to receive ASML’s advanced EXE:5000 High NA EUV lithography machine within the year. This acquisition aims to bolster TSMC’s capabilities in producing advanced 2nm and memory node chips, thereby reducing process complexity in high-volume manufacturing.
