“Growing Shift towards Extreme Ultraviolet (EUV) Lithography”
The global lithography equipment market is witnessing several key trends that are shaping its future growth. One major trend is the growing shift towards extreme ultraviolet (EUV) lithography, which enables the production of smaller, more complex semiconductor devices with higher efficiency. EUV technology is becoming increasingly vital as demand for smaller node sizes (below 7nm) rises in industries such as 5G, AI, and automotive electronics. Another trend is the increasing investment in R&D to develop next-generation lithography systems that offer higher resolution, faster throughput, and cost-effective solutions. Additionally, the integration of automation and artificial intelligence (AI) in lithography equipment is improving the precision and efficiency of the manufacturing process.
